- Country: Italy
- Summary: System for the Removal of Rie Type Plasma Materials Reactive Ion Etching
- ITT Ref No: 92500762
- Deadline: 10 Dec 2023
- Financier: Self Financed
- Purchaser Ownership: Government
- Tender Value: EUR 850000.00
- Notice Type: Tender
- Document Ref. No.: 706104-2023
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- Description:
- SUPPLY, INSTALLATION AND COMMISSIONING OF A PLASMA ETCHING SYSTEM FOR THE REMOVAL IN PLASMA OF OXIDES, OXY-NITURES AND NITURES OF SILICON, POLY-SILICON, DOPPED ON PRODUCTION BATCHES OF 25 WAFERS OF 150 MM SUBSTRATES PREPARED TO TREAT SUBSTRATES DA 200 MM.
Doc Title: Research, texts8965740e25c5159704771322c83775d6ng and scientific technical simulator
Contract Type: Supplies - Documents:
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CLICK HERE TO LOGINSystem for the Removal of Rie Type Plasma Materials Reactive Ion Etching - Italy Tender
The INSTITUTE OF PHOTONICS AND NANOTECHNOLOGIES OF THE CNR, a Government sector organization in Italy, has announced a new tender for System for the Removal of Rie Type Plasma Materials Reactive Ion Etching. This tender is published on ItalyTenders under ITT Ref No: 92500762 and is categorized as a Tender. Interested and eligible suppliers are invited to participate by reviewing the tender documents and submitting their bids before the deadline on 2023-12-10.
The estimated tender value is EUR 850000.00, and full details, including technical specifications and submission requirements, are provided in the official tender documents. Ensure all submissions meet the criteria outlined to be considered for evaluation.
